铝掺杂氧化锌薄膜的制备及其光电学性能研究(含任务书,开题报告,外文翻译,毕业论文8500字,答辩PPT)
摘要
铝掺杂氧化锌薄膜是一种性能优良的透明导电薄膜，在生活中的应用十分广泛，如太阳能电池、液晶显示器、节能视窗等方面，同时具有光电特性好，材料来源丰富，稳定性好，成本低廉等优点。氧化锌铝薄膜制备的方法很多，如磁控溅射、溶胶-凝胶法、电子束蒸发法、金属有机化学气相沉积法、脉冲激光沉积法等。其中磁控溅射法具有沉积薄膜质量好、沉积温度低、沉积速率快、衬底与薄膜的粘附性好、适合工业化生产等优点。本论文主要采用磁控溅射技术在载玻片上制备了铝掺杂氧化锌薄膜，研究了工作气压和氩氧比对铝掺杂氧化锌薄膜结构、电学及光学性能的影响。采用X射线衍射仪、光谱椭偏仪、四点探针电阻率测试仪和紫外-可见分光光度计对铝掺杂氧化锌薄膜的结构、折射率、电学和光学性能进行了测试，研究表明，所制备薄膜均为结晶结构；随着工作气压的增大，薄膜的方块电阻先增大后减小；随着氩氧比的增加，薄膜的折射率先增大后减小，带隙减小，电阻率先增大后减小，可见区的透射率增大。
关键词：氧化锌铝；掺杂；磁控溅射；氩氧比
Al-doped ZnO thin films and their optical properties of Research
Abstract
Al-doped ZnO films, an excellent transparent conductive films, has been widely used in many fields such as solar cells, liquid crystal displays, and Energy Saving Windows, etc, because of its good electrical and optical properties, rich sources of material, good stability, and low cost. Up to now, many techniques, such as sol-gel method, sputtering, electron beam evaporation, metal organic chemical vapor deposition, pulsed laser deposition method etc., have been successfully used to prepare Al-doped ZnO thin films thin films. And the magnetron sputtering technique is widely used in industrial production because of its low deposition temperature, high deposition rate, good adhesion between the substrate and the film. Al-doped ZnO thin films were prepared by magnetron sputtering on glass substrates from Al:ZnO target in a mixed gas of oxygen and argon. And influence of the working pressure, argon oxygen ratio on the structure, optical and electrical properties of Al-doped ZnO thin films were researched. Spectroellipsometry, X-ray diffraction structure analysis, four-probe resistance and UV-Visible spectrophotometer were used to determine the structure, optical and electrical properties of Al-doped ZnO thin films. The results show that the films are all crystallized. The resistivity of the films increases firstly and then decrease with the increase of working pressure. With the Ar:O2 ratio increasing, the refractive index increases firstly and then decrease, the energy bandgap decreases, the resistivity increases firstly and then decrease, the transmittance increases in the visible wavelength.
Keywords：AZO; Doping; Magnetron sputtering; Argon-oxygen ratio
本课题的研究内容
1磁控溅射工艺具有沉积速率高、均匀性好等优点而成为一种广泛应用的成膜方法。因此如何使用磁控溅射制备AZO薄膜，并研究不同参数的AZO薄膜的制备条件下的综合影响，如控制其他参数不变的情况下，改变Ar:O2比，得出在一定条件下不同氩氧比对实验结果（即方阻率）的影响。
2 运用表征手段如X射线衍射仪（XRD）、扫描电镜（SEM）等设备对铝掺杂氧化锌薄膜结构和形貌的影响，进而影响其光电性能的原因。
目 录
摘 要 1
Abstract 2
1引言 3
1.1 氧化锌的结构和性质 3
1.2 氧化锌铝薄膜材料的应用 3
1.3氧化锌薄膜材料的研究背景 4
1.4 AZO薄膜的国内外研究发展现状 4
1.5 磁控溅射镀膜的制备工艺及原理 6
1.6 本课题的研究内容 7
2实验 7
2.1主要的实验仪器和设备 7
2.2 样品制备 8
2.3 样品检测 9
2.4 实验方案 10
3 结果和讨论 11
3.1薄膜的XRD表征 13
3.2椭偏仪的模型建立和拟合结果表征 14
3.3 电学性能测试 17
3.4 AZO薄膜的光学特性（透过率） 19
4结论 20
5参考文献 21
6致谢 23
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