多晶硅薄膜的制备方法

多晶硅薄膜的制备方法
摘要：低压化学气相沉积、固相晶化、准分子激光晶化、快速热退火、金属诱导晶化、等离子体增强化学反应气相沉积等是目前用于制备多晶硅薄膜的几种主要方法。它们具有各自不同的制备原理、晶化机理、及其优缺点。
关键词：氢化非晶硅 多晶硅 晶化

The preparation methods of polycrystalline silicon film
Abstract: At present，The preparation methods of polycrystalline silicon film，including Low pressure Chemical Vapor Deposition、Solide Phase Crystallization、Excimer Laser Annealing、 Rapid Thermal Annealing、Metal Induced  Crystallization、plasma enhanced chemical vapor deposition，are being developed. we review typical preparation methods of polycrystalline silicon film、Crystallization Mechanism、their Advantage and Disadvantage.
Keywords: a-Si:Ｈ,Polycrystalline silicon, Crystallization 

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